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Department of Dermatology

iconLisa A. DeLouise, Ph.D., M.P.D.

Assistant Professor, Department of Dermatology
Lisa_DeLouise@urmc.rochester.edu

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Education

Institution
Location
Degree
Year
Providence College Providence, RI B.S. (Chemistry) 1979
Pennsylvania State Univ Pennsylvania Ph.D. (Phys Chemistry) 1984
Rochester Institute of Technology Rochester, NY Master in Prod Devel 2001

Academic Appointments and Professional Experience

05-present Assistant Professor, Dermatology Department, University of Rochester
3/04-05 Instructor, Dermatology Department, University of Rochester
2001-2004 Postdoctoral Research Fellow (Dermatology), University of Rochester
1998-2001 R&D Scientist/Project Manager – Ink Jet Business Unit – Xerox Corp.
1996-97 Senior Technical Staff – Workgroup Specialty Products – Xerox Corp.
1993-95 Member of the Research Staff-Microsystems Chemistry and Fabrication – Xerox Corp.
1985-93 Member of the Research Staff-Interfaces and Processing Group- Xerox Corp.
1984-85

Visiting Scientist-IBM Research Laboratories, San Jose, CA

Committees and Appointments

  • High Technology of Rochester – Advisor on Industrial Cluster Economic stimulus initiatives, 2002
  • Served on the Executive Program and Award Committees of the Local Material Research, American Vacuum and American Chemical Societies 1996-1995
  • Program Chair for the 1995 ACS NERM Meeting
  • Referee for Surface Science, J of Physical Chemistry and J of Vacuum Science and Technology
  • Adhoc Grant Review Committee for NSF, DOE, AFOSR, NRL from 1987-1995

Journal Articles

  1. L.A. DeLouise, E. J. White and N. Winograd, "Characterization of CO Binding Sites on the Rh (111) and Rh (331) Surfaces by XPS and LEED: Comparison to EELS Results", Surface Sci. 147, 252-262 (1984) .
  2. L.A. DeLouise and N. Winograd, "Characterization of the Molecular Adsorption and Desorption of Carbon Monoxide from Rhodium Surfaces", Surface Sci. 138, 417 (1984).
  3. L.A. DeLouise and N. Winograd, “Influence of Steps on the Reactivity of NO on Clean and Pretreated Rhodium Single Crystal Surfaces”, Bull. Am. Phys. Soc. 29, 347 (1984).
  4. L.A. DeLouise and N. Winograd, "Adsorption and Desorption of NO From the Rh (111) and Rh (331) Surfaces," Surface Science 159, 199-213 (1985) .
  5. L.A. DeLouise and N. Winograd, "Reduction of Nitric Oxide on the Carbon Pretreated Rh(331) Single Crystal Surface: Evidence For Molecular CN-Formation", Surface Sci. 154, 79 (1985).
  6. Che-Chen Chang, L.A. DeLouise, N. Winograd, and B.J. Garrison, "Velocity Dependence of Azimuthal Anisotropy’s in Ion Scattering from Rh(111)", Surface Science 154, 22-34 (1985).
  7. T. Rettner, L.A. DeLouise, J. P. Cowin, D. J. Auerbach, “Rotationally Mediated Selective Adsorption, Physisorption and Dissociative Chemisorption of HD on W(110)”, Chem. Phys. Lett. 118,355 (1985).
  8. T. Rettner, L.A. DeLouise, J. P. Cowin, D. J. Auerbach, ”Rotationally Mediated Selective Adsorption of HD on W(110): Physisorption Without Chemisorption”, Faraday Discuss. Chem. Soc. 80, 1 (1985).
  9. White, L.A. DeLouise and N. Winograd, "SIMS/XPS Studies of Surface Reaction on Rh (111) and Rh (331)”, Springer Series in Chemical Physics 44, 219 (1986).
  10. C. T. Rettner, L.A. DeLouise, and D.J. Auerbach, "Molecular Beam Study of the Dissociation Chemisorption of Oxygen in W(110)", J. Vac. Sci. Technol. 4, 1491 (1986).
  11. C. T. Rettner, L.A. DeLouise, and D. J. Auerbach, "Effect of Incidence Kinetic Energy and Surface Coverage on the Dissociative Chemisorption of Oxygen on W(110)," J. Chem. Phys. 85, 1131 (1986).
  12. R. Levis, N. Winograd, and L.A. DeLouise, "The Influence of Surface Atomic Steps on Site-Selective Adsorption Processes: Ethylidyne Formation on Rh(111) and Rh(331)", JACS 109, 6873 (1987) .
  13. H.H. Rotermund, V. Penka, L.A. DeLouise, and C.R. Brundle, "Oxygen interaction with Pd 3Sn: X-ray photoelectron Spectroscopy and Secondary Ion Mass Spectrometry”, J. Vac. Sci. Technol. A5, 1198 (1987).
  14. R. Levis, L.A. DeLouise, E.J. White, and N. Winograd, " Defect induced surface chemistry: A comparison of the adsorption and thermal decomposition of C2H4 on Rh{111} and Rh{331},", Surface Sci. 230, 35-46 (1990).
  15. L.A. DeLouise, “Angle-Resolved Supersonic Molecular Beam Study of the Cl 2/GaAs(110) Thermal Etching Reaction”, J. Chem. Phys. 94, 1528 (1991).
  16. L.A. DeLouise, “Evidence for Precursor-Mediated Cl 2 Etching of GaAs(110): Effect of Surface Temperature and Incident Translational Energy on the Reaction Probability”, J. Vac. Sci. Technol., A9, 1732 (1991).
  17. L.A. DeLouise, “Supersonic Molecular Beam Study of the Trapping of Cl 2 on GaAs(110): Dissociative Chemisorption and Desorption”, Surface Sci. Lett., 244, L87-L95 (1991).
  18. L.A. DeLouise, “Trapping Dynamics in Reactive Gas/Surface Scattering: Importance of Parallel Momentum Accommodation”, Chem. Phys. Lett., 180, 149 (1991).
  19. L.A. DeLouise, “Investigation of the Mechanism of Ar + Ion-Assisted Cl 2/GaAs(110) Etching: Role of Ion-Induced Charge Acceptor States”, J. Appl. Phys., 70, 1718 (1991).
  20. L.A. DeLouise, “Dynamical Study of the Ar + Ion Enhanced Cl 2/GaAs{110} Etch Rate Phenomenon : Dependence on the Reactant Flux Ratio”, International Symposium on Surface Science, Thin Films and Vacuum, Wuxi CHINA, Vacuum 43(11), 1083 (1992).
  21. L.A. DeLouise, “Investigation of the Ar + Ion Enhanced Cl 2/GaAs{110} Etch Rate Phenomenon: Dependence on the Reactant Flux Ratio”, J. Appl. Phys. 72(4), 1608 (1992).
  22. L.A. DeLouise, “Reactive N 2 + Ion Bombardment of GaAs(100): A Method for GaN Thin Film Growth”, J. Vac. Sci. and Technol. A(10), 1637 (1992).
  23. L.A. DeLouise, “Nitridation of GaAs(110) Using Energetic N + and N 2 + Ion Beams”, J. Vac. Sci. and Technol. A(11), 609 (1993).
  24. L.A. DeLouise, “Investigation of the Dynamics of the Cl 2/GaAs(110) Thermal and the Ar + Ion Enhanced Etching Mechanisms”, Proceedings from the, International Workshop on Science and Technology for Surface Reaction Processes, Toyko JAPAN, pg. 75 (1992).
  25. C.A. Schmuttenmaer, J. Qian, S.G. Donnelly, M.J. DeLuca, D.F. Varley, L.A. DeLouise, R.J.D. Miller and J.M. Farrar. “Time Dependence of the Photodissociation of Sr +(NH 3) 2”, J. Phys. Chem. 97(13) 3077 (1993).
  26. Y.R. Wang, L.A. DeLouise and T.E. Orlowski, “Unusual Angular Dependence of Trapping Probability at Highly Corrugated Surfaces”, J. Chem. Phys, 99, 5508 (1993).
  27. Ming L. Yu and L.A. DeLouise, “Surface Reactions on Semiconductors Studied by Molecular Beam Reactive Scattering”, Surface Science Reports 19, 286 (1994).
  28. L.A. DeLouise, “Investigation of the Chemical Mechanisms of Ta(110)/Ta(110)-suboxide Etch Selectivity Using Cl 2 Molecular Beams.”, Surface Sci. 324 (2-3), 233-248 (1995)
  29. L.A. DeLouise and B.L. Miller, "Optimization of Mesoporous Silicon Microcavities for Proteomic Sensing", Mat. Res. Soc. Symp. Proc. Vol. 782, A5.3.1, (2004).
  30. L.A. DeLouise and B.L. Miller , " Trends in Porous Silicon Biomedical Devices - Tuning Microstructure and Performance Trade-offs in Optical Biosensors ", Proceedings of SPIE Vol. 5357, pg. 111-125, 2004.
  31. L.A. DeLouise and B.L. Miller , "Quantitative Assessment of Enzyme Immobilization Capacity in Porous Silicon” , Analytical Chemistry (In Press).